Etching of lithium niobate using standard Ti indiffusion technique | Zendy

Vijay Sivan | Zendy; Arnan Mitchell | Zendy; Lam Anh Bui | Zendy; Anthony S. Holland | Zendy; Suresh K. Bhargava | Zendy; Timothy Priest | Zendy

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Etching of lithium niobate using standard Ti indiffusion technique

Author(s) -

Vijay Sivan,

Arnan Mitchell,

Lam Anh Bui,

Anthony S. Holland,

Suresh K. Bhargava,

Timothy Priest

Publication year - 2007

Publication title -

applied physics letters

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.182

H-Index - 442

eISSN - 1077-3118

pISSN - 0003-6951

DOI - 10.1063/1.2821111

Subject(s) - lithium niobate , materials science , wafer , etching (microfabrication) , annealing (glass) , surface roughness , surface finish , engraving , atomic force microscopy , composite material , mineralogy , optoelectronics , optics , nanotechnology , chemistry , layer (electronics) , physics

We present evidence of etching LiNbO3 when annealing two wafers in contact with an intermediate Ti strip. Etched features are characterized qualitatively using atomic force microscopy. The impact of the Ti strip thickness on the depth and roughness of the etched surface is quantified. Etched trenches of similar depths to the original Ti film are achieved with very smooth etched surface.

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