Open AccessErratum: “Control of silicidation in HfO2/Si(100) interfaces” [Appl. Phys. Lett. 86, 041913 (2005)]
Author(s) -
DeokYong Cho,
Kee-Shik Park,
B. H. Choi,
Seungjun Oh,
Ying Chang,
D. H. Kim,
Tae Won Noh,
Ranju Jung,
Jae-Cheol Lee,
Sang Don Bu
Publication year - 2007
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.2802071
Subject(s) - materials science , engineering physics , condensed matter physics , optoelectronics , physics
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