Metrology and Optical Characterization of Plasma Enhanced Chemical Vapor Deposition, (PECVD), low temperature deposited Amorphous Carbon films | Zendy

F. Ferrieu | Zendy; C. Chaton | Zendy; D. Neira | Zendy; C. Beitia | Zendy; L. Proenca Mota | Zendy; AnneMarie Papon | Zendy; A. Tarnowka | Zendy; David G. Seiler | Zendy; Alain C. Diebold | Zendy; Robert McDonald | Zendy; C. Michael Garner | Zendy; Dan Herr | Zendy; Rajinder P. Khosla | Zendy; Erik M. Secula | Zendy

Open Access

Metrology and Optical Characterization of Plasma Enhanced Chemical Vapor Deposition, (PECVD), low temperature deposited Amorphous Carbon films

Author(s) -

F. Ferrieu,

C. Chaton,

D. Neira,

C. Beitia,

L. Proenca Mota,

AnneMarie Papon,

A. Tarnowka,

David G. Seiler,

Alain C. Diebold,

Robert McDonald,

C. Michael Garner,

Dan Herr,

Rajinder P. Khosla,

Erik M. Secula

Publication year - 2007

Publication title -

aip conference proceedings

Language(s) - English

Resource type - Conference proceedings

SCImago Journal Rank - 0.177

H-Index - 75

eISSN - 1551-7616

pISSN - 0094-243X

DOI - 10.1063/1.2799445

Subject(s) - materials science , amorphous solid , carbon film , plasma enhanced chemical vapor deposition , chemical vapor deposition , thin film , amorphous carbon , ellipsometry , characterization (materials science) , deposition (geology) , reflectometry , optoelectronics , nanotechnology , optics , analytical chemistry (journal) , computer science , organic chemistry , chemistry , physics , paleontology , sediment , biology , time domain , computer vision

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