Protocol Optimisation For Work-Function Measurements Of Metal Gates Using Kelvin Force Microscopy | Zendy

D. Mariolle | Zendy; Khaled Kaja | Zendy; F. Bertin | Zendy; E. Martínez | Zendy; F. Martı́n | Zendy; R. Gassilloud | Zendy; David G. Seiler | Zendy; Alain C. Diebold | Zendy; Robert McDonald | Zendy; C. Michael Garner | Zendy; Dan Herr | Zendy; Rajinder P. Khosla | Zendy; Erik M. Secula | Zendy

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Protocol Optimisation For Work-Function Measurements Of Metal Gates Using Kelvin Force Microscopy

Author(s) -

D. Mariolle,

Khaled Kaja,

F. Bertin,

E. Martínez,

F. Martı́n,

R. Gassilloud,

David G. Seiler,

Alain C. Diebold,

Robert McDonald,

C. Michael Garner,

Dan Herr,

Rajinder P. Khosla,

Erik M. Secula

Publication year - 2007

Publication title -

aip conference proceedings

Language(s) - English

Resource type - Conference proceedings

SCImago Journal Rank - 0.177

H-Index - 75

eISSN - 1551-7616

pISSN - 0094-243X

DOI - 10.1063/1.2799428

Subject(s) - kelvin probe force microscope , work function , materials science , work (physics) , capacitor , optoelectronics , capacitance , microscopy , auger electron spectroscopy , metal gate , sensitivity (control systems) , voltage , nanotechnology , analytical chemistry (journal) , atomic force microscopy , electrical engineering , electronic engineering , gate oxide , layer (electronics) , optics , chemistry , transistor , physics , engineering , mechanical engineering , electrode , nuclear physics , chromatography

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