Open AccessMetrology for Grayscale Lithography
Author(s) -
Raghunath Murali,
David G. Seiler,
Alain C. Diebold,
Robert McDonald,
C. Michael Garner,
Dan Herr,
Rajinder P. Khosla,
Erik M. Secula
Publication year - 2007
Publication title -
aip conference proceedings
Language(s) - Uncategorized
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.2799410
Subject(s) - grayscale , lithography , computational lithography , metrology , next generation lithography , materials science , process (computing) , dimensional metrology , x ray lithography , optics , computer science , electron beam lithography , resist , optoelectronics , artificial intelligence , nanotechnology , physics , image (mathematics) , layer (electronics) , operating system
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