Open AccessUltra Low-κ Metrology Using X-Ray Reflectivity And Small-Angle X-Ray Scattering Techniques
Author(s) -
L. Plantier,
J. P. Gonchond,
Frederic Pernot,
A. Peled,
C. Wyon,
Jean-Claude Royer,
Boris Yokhin,
David G. Seiler,
Alain C. Diebold,
Robert McDonald,
C. Michael Garner,
Dan Herr,
Rajinder P. Khosla,
Erik M. Secula
Publication year - 2007
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.2799395
Subject(s) - x ray reflectivity , metrology , materials science , optics , small angle x ray scattering , scattering , x ray optics , small angle scattering , reflectivity , optoelectronics , x ray , physics
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