Open AccessProcess Monitoring And Surface Characterization By XPS In A Semiconductor Fabrication Line
Author(s) -
Nicolas Cabuil,
A. Le Gouil,
B.L. Dickson,
A. Lagha,
M.-A. Aminpur,
C. Chaton,
Jean-Claude Royer,
O. Doclot,
David G. Seiler,
Alain C. Diebold,
Robert McDonald,
C. Michael Garner,
Daniel Herr,
Rajinder P. Khosla,
Erik M. Secula
Publication year - 2007
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.2799368
Subject(s) - x ray photoelectron spectroscopy , wafer , materials science , amorphous solid , fabrication , silicon , characterization (materials science) , chemical state , thin film , optoelectronics , nanotechnology , chemical engineering , chemistry , medicine , alternative medicine , organic chemistry , pathology , engineering
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