SIMS Analyses Of Ultra-Low Energy B Ion Implants In Si: Evaluation Of Profile Shape And Dose Accuracy | Zendy

C. W. Magee | Zendy; R. S. Hockett | Zendy; Temel Büyüklimanli | Zendy; Ihab M. Abdelrehim | Zendy; John Marino | Zendy; David G. Seiler | Zendy; Alain C. Diebold | Zendy; Robert McDonald | Zendy; C. Michael Garner | Zendy; Daniel Herr | Zendy; Rajinder P. Khosla | Zendy; Erik M. Secula | Zendy

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SIMS Analyses Of Ultra-Low Energy B Ion Implants In Si: Evaluation Of Profile Shape And Dose Accuracy

Author(s) -

C. W. Magee,

R. S. Hockett,

Temel Büyüklimanli,

Ihab M. Abdelrehim,

John Marino,

David G. Seiler,

Alain C. Diebold,

Robert McDonald,

C. Michael Garner,

Daniel Herr,

Rajinder P. Khosla,

Erik M. Secula

Publication year - 2007

Publication title -

aip conference proceedings

Language(s) - English

Resource type - Conference proceedings

SCImago Journal Rank - 0.177

H-Index - 75

eISSN - 1551-7616

pISSN - 0094-243X

DOI - 10.1063/1.2799359

Subject(s) - materials science , elastic recoil detection , nuclear reaction analysis , secondary ion mass spectrometry , oxidizing agent , dopant , ion beam analysis , recoil , analytical chemistry (journal) , ion , optoelectronics , atomic physics , doping , nanotechnology , chemistry , ion beam , thin film , physics , organic chemistry , chromatography

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