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Extraordinary optical gain from silicon implanted with erbium
Author(s) -
M. A. Lourenço,
R. Gwilliam,
K.P. Homewood
Publication year - 2007
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.2797975
Subject(s) - silicon , erbium , materials science , optoelectronics , optical amplifier , laser , silicon photonics , hybrid silicon laser , gain , amplifier , optics , active laser medium , doping , laser power scaling , physics , cmos
Here we report on measurements of optical gain at 1.5μm in crystalline silicon. Gain is achieved by the incorporation of the rare earth erbium in silicon. A method was developed to enable the gain measurement in short silicon waveguides. Crucially, gain values obtained are significantly greater than previously supposed. We have measured a lower limit for the optical cross section for Er3+ of 5×10−19cm2, 30 times higher than previously anticipated. Given these higher values, this system now offers a realistic route to the production of electrically pumped silicon optical amplifier and laser devices using standard silicon process technology.

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