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Deposition and crystallization studies of thin amorphous solid water films on Ru(0001) and on CO-precovered Ru(0001)
Author(s) -
Takahiro Kondo,
Hiroyuki Kato,
Mischa Bonn,
Maki Kawai
Publication year - 2007
Publication title -
the journal of chemical physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.071
H-Index - 357
eISSN - 1089-7690
pISSN - 0021-9606
DOI - 10.1063/1.2770726
Subject(s) - crystallization , nucleation , amorphous solid , thin film , chemical engineering , desorption , deposition (geology) , materials science , substrate (aquarium) , analytical chemistry (journal) , isothermal process , monolayer , chemistry , crystallography , adsorption , nanotechnology , thermodynamics , organic chemistry , paleontology , oceanography , sediment , geology , engineering , biology , physics
The deposition and the isothermal crystallization kinetics of thin amorphous solid water (ASW) films on both Ru(0001) and CO-precovered Ru(0001) have been investigated in real time by simultaneously employing helium atom scattering, infrared reflection absorption spectroscopy, and isothermal temperature-programmed desorption. During ASW deposition, the interaction between water and the substrate depends critically on the amount of preadsorbed CO. However, the mechanism and kinetics of the crystallization of ~50 layers thick ASW film were found to be independent of the amount of preadsorbed CO. We demonstrate that crystallization occurs through random nucleation events in the bulk of the material, followed by homogeneous growth, for solid water on both substrates. The morphological change involving the formation of three-dimensional grains of crystalline ice results in the exposure of the water monolayer just above the substrate to the vacuum during the crystallization process on both substrates

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