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Dissolution of metal precipitates in multicrystalline silicon during annealing and the protective effect of phosphorus emitters
Author(s) -
J. Tan,
Daniel Macdonald,
Neil Bennett,
Dal Sung Kong,
A. Cuevas,
I.G. Romijn
Publication year - 2007
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.2766664
Subject(s) - dissolution , annealing (glass) , silicon , materials science , metallurgy , carrier lifetime , metal , precipitation , chemical engineering , engineering , physics , meteorology
The degradation of the carrier lifetime in multicrystalline silicon due to the dissolution of metal precipitates during high temperature annealing is well known. This letter presents evidence indicating that the presence of phosphorus emitters during annealing can help reduce this recontamination. Part of the degradation observed is due to increased interstitial iron concentrations caused by the dissolution of iron precipitates during annealing. However, dissolution of other metals also seems to contribute to the reduced carrier lifetimes observed. © 2007 American Institute of Physics. DOI: 10.1063/1.2766664

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