Optimal roughness for minimal adhesion | Zendy

D.-L. Liu | Zendy; Jack Martin | Zendy; N. A. Burnham | Zendy

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Optimal roughness for minimal adhesion

Author(s) -

D.-L. Liu,

Jack Martin,

N. A. Burnham

Publication year - 2007

Publication title -

applied physics letters

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.182

H-Index - 442

eISSN - 1077-3118

pISSN - 0003-6951

DOI - 10.1063/1.2763981

Subject(s) - stiction , materials science , asperity (geotechnical engineering) , surface finish , adhesion , surface roughness , microelectromechanical systems , wafer , adhesive , nanoscopic scale , cantilever , silicon , composite material , atomic force microscopy , nanotechnology , mechanics , optoelectronics , layer (electronics) , physics

A single-asperity model was used to describe a smooth tip in contact with a rough surface and the total interaction force for all molecules interacting with the sample was obtained.(1) R: tip radius Ra: RMS roughness --- asperity radius hc : separation at contact 2πωR: the pull-off force for a smooth contact (Ra = 0) Assumption: hc << R

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