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Optofluidic maskless lithography system for real-time synthesis of photopolymerized microstructures in microfluidic channels
Author(s) -
Su Eun Chung,
Wook Park,
Hyun-Sung Park,
Kyoungsik Yu,
Namkyoo Park,
Sunghoon Kwon
Publication year - 2007
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.2759988
Subject(s) - microfluidics , photopolymer , lithography , materials science , fabrication , nanotechnology , photolithography , maskless lithography , optofluidics , microstructure , optoelectronics , polymerization , electron beam lithography , polymer , resist , medicine , alternative medicine , pathology , layer (electronics) , metallurgy , composite material
The authors propose an optofluidic maskless lithography technique that can dynamically synthesize free-floating polymeric microstructures inside microfluidic channels by selectively polymerizing photocurable resin with high-speed two-dimensional spatial light modulators. The combination of programable optical projection and microfluidic devices allows one to precisely control the timing and location of the photopolymerization process for microstructure fabrication. Real-time generation of microparticles with various shapes, sizes, ordering, and material contents are experimentally demonstrated. Long polymeric structures of which size is not limited by the exposure field of view can also be fabricated.

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