Open AccessCharge storage characteristics of atomic layer deposited RuOx nanocrystals
Author(s) -
S. Maikap,
T. Y. Wang,
P. J. Tzeng,
ChiaHua Lin,
L. S. Lee,
JerRen Yang,
M.-J. Tsai
Publication year - 2007
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.2749857
Subject(s) - nanocrystal , materials science , capacitor , optoelectronics , layer (electronics) , nanotechnology , non volatile memory , trapping , voltage , electrical engineering , ecology , biology , engineering
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