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Strain enhancement during annealing of GaAsN alloys
Author(s) -
Qiandong Zhuang,
A. Krier,
C.R. Stanley
Publication year - 2007
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.2717603
Subject(s) - annealing (glass) , photoluminescence , materials science , laser linewidth , blueshift , alloy , diffraction , homogeneity (statistics) , condensed matter physics , crystallography , analytical chemistry (journal) , optoelectronics , metallurgy , chemistry , optics , laser , statistics , physics , mathematics , chromatography
We have investigated the effect of rapid thermal annealing (RTA) on the optical and structural properties of GaAsN alloys using photoluminescence (PL) and double-crystal x-ray diffraction. We observe a significant anomalous strain enhancement during RTA and a blueshift of the PL peak energy accompanied by a reduction in the emission linewidth. The PL features are attributed to an improvement in the homogeneity of the alloy, and the strain enhancement reflects a change in N-related complexes during annealing. Based on a defect model, an interstitial nitrogen concentration of 1.8×1019 cm−3 is deduced prior to annealing

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