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Voltage- and light-induced hysteresis effects at the high-k dielectric—poly(3-hexylthiophene) interface
Author(s) -
James Lancaster,
David Taylor,
Paul Sayers,
Henrique L. Gomes
Publication year - 2007
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.2711531
Subject(s) - materials science , capacitor , insulator (electricity) , dielectric , optoelectronics , semiconductor , capacitance , atomic layer deposition , voltage , aluminium , band gap , photon energy , hysteresis , thin film , condensed matter physics , electrode , photon , optics , chemistry , nanotechnology , electrical engineering , composite material , physics , engineering
Capacitance-voltage (C-V) measurements have been undertaken on metal-insulator-semiconductor capacitors formed from atomic-layer-deposited films of aluminium titanium oxide as the insulator and poly(3-hexylthiophene) as the insulator. Upon cycling from -30 to +30 V in the dark, the C-V plots show large, temperature-dependent, reversible shifts in the flatband voltage to more negative voltages consistent with reversible, shallow hole trapping at or near the insulator-semiconductor interface. When illuminated with photons of energy exceeding the polymer band gap, even larger shifts to positive voltages are observed accompanied by inversion layer formation. This latter effect has potential applications in optical sensing. (c) 2007 American Institute of Physics

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