Hollow oxide formation by oxidation of Al and Cu nanoparticles | Zendy

Ryusuke Nakamura | Zendy; Daisuke Tokozakura | Zendy; Hideo Nakajima | Zendy; J.-G. Lee | Zendy; H. Mori | Zendy

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Hollow oxide formation by oxidation of Al and Cu nanoparticles

Author(s) -

Ryusuke Nakamura,

Daisuke Tokozakura,

Hideo Nakajima,

J.-G. Lee,

H. Mori

Publication year - 2007

Publication title -

journal of applied physics

Language(s) - English

Resource type - Journals

eISSN - 1089-7550

pISSN - 0021-8979

DOI - 10.1063/1.2711383

Subject(s) - kirkendall effect , oxide , nanoparticle , diffusion , vacancy defect , metal , materials science , transmission electron microscopy , chemical engineering , oxygen , thermal diffusivity , layer (electronics) , ion , inorganic chemistry , chemistry , nanotechnology , crystallography , metallurgy , organic chemistry , physics , quantum mechanics , engineering , thermodynamics

The formation of hollow metal oxide nanoparticles through the oxidation process at low temperatures from 295 to 423 K has been studied by transmission electron microscopy for Cu, Al, and Pb. For Cu and Al, hollow oxide nanoparticles are obtained as a result of vacancy aggregation in the oxidation processes, resulting from the rapid outward diffusion of metal ions through the oxide layer during the oxidation process. On the other hand, Pb nanoparticles turn to solid PbO because the diffusivity difference DPb

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