Submicron-diameter semiconductor pillar microcavities with very high quality factors
Author(s) -
G. Lecamp,
J. P. Hugonin,
Philippe Lalanne,
Rémy Braive,
S. Varoutsis,
S. Laurent,
A. Lemaı̂tre,
I. Sagnes,
G. Patriarche,
I. Robert-Philip,
I. Abram
Publication year - 2007
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.2711186
Subject(s) - pillar , materials science , cladding (metalworking) , fabrication , semiconductor , optoelectronics , quality (philosophy) , optics , q factor , quasiperiodic function , condensed matter physics , physics , composite material , resonator , medicine , alternative medicine , structural engineering , pathology , quantum mechanics , engineering
International audiencePillar microcavities are subject to two common fabrication artifacts: Bragg mirror corrugation and oxide deposit cladding. In this letter the authors investigate the impact of these features on the quality factor. A quasiperiodic variation of the quality factor as a function of the pillar diameter is experimentally observed and well described by theory. Moreover, observation of quality factors in excess of 1500, close to the theoretical limit, is reported for 600-nm-diameter GaAs micropillars bounded by AlGaAs/GaAs Bragg mirrors
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