Open AccessExtreme ultraviolet holographic lithography: Initial results
Author(s) -
Yangchun Cheng,
Artak Isoyan,
John Wallace,
Mumit Khan,
F. Cerrina
Publication year - 2007
Publication title -
applied physics letters
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.2430774
Subject(s) - extreme ultraviolet lithography , extreme ultraviolet , holography , lithography , optics , materials science , photoresist , x ray lithography , optoelectronics , resist , undulator , diffraction , wavelength , radiation , layer (electronics) , physics , laser , nanotechnology
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