Ultrafast carrier thermalization in InN
Author(s) -
YuChieh Wen,
Cheng–Ying Chen,
Chang-Hong Shen,
Shangjr Gwo,
ChiKuang Sun
Publication year - 2006
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.2402899
Subject(s) - thermalisation , femtosecond , plasma , atomic physics , doping , phonon , materials science , excitation , ultrashort pulse , electron , carrier lifetime , electron mobility , semiconductor , condensed matter physics , molecular physics , chemistry , optoelectronics , physics , silicon , optics , laser , quantum mechanics
[[abstract]]Carrier thermalization dynamics in heavily doped n-type InN was investigated at room temperature with a femtosecond transient transmission measurement. The dependence of hot carrier cooling time on the total electron density indicates that the plasma screening of electron-LO phonon interactions is responsible for the reduction in energy-loss rate. Under low excitation, the carriers with different excess energies can be found to cool down with a fixed thermalization time of 1.4 ps. Intensity dependent study suggests that this relatively slow carrier cooling time could be attributed to the screening effect by high-background-doping plasma rather than the hot phonon effect.[[fileno]]2010109010080[[department]]物理
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