Point contact Andreev reflection by nanoindentation of polymethyl methacrylate | Zendy

E. Clifford | Zendy; J. M. D. Coey | Zendy

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Point contact Andreev reflection by nanoindentation of polymethyl methacrylate

Author(s) -

E. Clifford,

J. M. D. Coey

Publication year - 2006

Publication title -

applied physics letters

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.182

H-Index - 442

eISSN - 1077-3118

pISSN - 0003-6951

DOI - 10.1063/1.2345361

Subject(s) - andreev reflection , nanoindenter , materials science , nanoindentation , photoresist , microscope , copper , thin film , sapphire , polymethyl methacrylate , bimetal , layer (electronics) , composite material , optics , condensed matter physics , nanotechnology , superconductivity , metallurgy , polymer , laser , physics

A versatile technique for performing spin polarization measurements via point contact Andreev reflection has been developed. This technique involves depositing a superconductor (lead) onto a thin film of the material to be studied through a nanohole formed in a layer of photoresist, using an atomic force microscope as a nanoindenter. Copper and nickel were used to demonstrate the method. The polarizations of CrO2 and Co2MnSi were also measured, the former giving a value of 95%, as expected, and the latter giving 20%, which was surprisingly low for a candidate half metal.

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