Open AccessDefect generation at SiO2∕Si interfaces by low pressure chemical vapor deposition of silicon nitride
Author(s) -
Hao Jin,
Klaus Weber,
Peter J. Smith
Publication year - 2006
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.2345247
Subject(s) - chemical vapor deposition , silicon nitride , silicon , photoconductivity , materials science , nitride , deposition (geology) , layer (electronics) , analytical chemistry (journal) , silicon oxynitride , chemistry , optoelectronics , nanotechnology , paleontology , sediment , chromatography , biology
Financial support for this project by the Australian Research Council DP0557398 is gratefully acknowledged.
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