Output properties of C60 field-effect transistor device with Eu source/drain electrodes
Author(s) -
Kenji Ochi,
Takayuki Nagano,
Toshio Ohta,
Ryo Nouchi,
Yoshihiro Kubozono,
Yukitaka Matsuoka,
Eiji Shikoh,
Akihiko Fujiwara
Publication year - 2006
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.2337990
Subject(s) - electrode , field effect transistor , materials science , optoelectronics , work function , transistor , electron mobility , induced high electron mobility transistor , field effect , condensed matter physics , nanotechnology , electrical engineering , chemistry , voltage , physics , layer (electronics) , engineering
Field-effect transistor (FET) device with thin films of C_<60> has been fabricated with Eu electrodes exhibiting small work function. The C_<60> FET device shows n-channel FET properties with high field-effect mobility, 0.50 cm^2 V^<-1> s^<-1>. Furthermore, nonvanishing drain current, i.e., normally on, is observed in this FET device. This originates from small energy barrier for electron from Eu source electrode to lowest unoccupied molecular orbital of C_<60>
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