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In this paper we show spin dependent transport experiments innanoconstrictions ranging from 30 to 200nm. These nanoconstrictions werefabricated combining electron beam lithography and thin film depositiontechniques. Two types of geometries have been fabricated and investigated. Wecompare the experimental results with the theoretical estimation of theelectrical resistance. Finally we show that the magnetoresistance for thedifferent geometries does not scale with the resistance of the structure andobtain drops in voltage of 20mV at 20Oe.

Magnetoresistance in thin Permalloy film (10nm thick and 30–200nm wide) nanocontacts fabricated by e-beam lithography