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Optical properties of inorganic AgSb recording thin film
Author(s) -
Y.H. Fang,
P. C. Kuo,
P. W. Chen,
Wei-Chih Hsu,
C.Y. Chou,
Ting Wu
Publication year - 2006
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.2218774
Subject(s) - thin film , materials science , sputter deposition , wavelength , sputtering , layer (electronics) , numerical aperture , optical recording , optics , contrast ratio , optical disc , phase (matter) , optoelectronics , thermal , nanotechnology , chemistry , physics , organic chemistry , meteorology
50nm Ag1−xSbx (x=10.8–25.5) thin films were prepared by magnetron sputtering. Thermal analysis shows that the phase change occurs around 250°C. The optical property analysis show that the as-deposited Ag80.9Sb19.1 films have high reflectivity of about 62%–73%. After heat treatment at 300°C, the contrast of Ag80.9Sb19.1 film is 12.5%–17% for wavelengths between 400 and 800nm. Dynamic test shows that using the Ag80.9Sb19.1 film as the memory layer of write once optical disk, a carrier-to-noise ratio of about 45dB can be achieved at λ=657nm, numerical aperture of 0.65, and a linear velocity of 3.5m∕s.

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