Temperature dependence of electroluminescence from silicon p-i-n light-emitting diodes
Author(s) -
Li Cheng,
Hongkai Lai,
Songyan Chen,
Takashi Suemasu,
Fumio Hasegawa
Publication year - 2006
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.2217107
Subject(s) - electroluminescence , silicon , materials science , blueshift , diode , optoelectronics , light emitting diode , electron , exciton , electron mobility , photoluminescence , condensed matter physics , layer (electronics) , nanotechnology , physics , quantum mechanics
The temperature dependence of electroluminescence from silicon p-i-n light-emitting diodes with a layer of beta-FeSi2 particles inserted in intrinsic silicon was investigated. Anomalous blueshift of the peak energy and enhanced electroluminescence intensity of the silicon band-edge emission were observed at temperatures from 50 to 200 K. The electroluminescence intensity was enhanced due to longer diffusion paths of the injected electrons at elevated temperature, as well as thermal escape of the electrons from the beta-FeSi2 particles. The low peak energy compared to that from bulk silicon at low temperature is due to the bound electron-hole pairs induced by the strain potential at the interface between silicon and beta-FeSi2 particles. The blueshift of the peak is ascribed to the transition of bound electron-hole pairs into free excitons at elevated temperature. Room temperature electroluminescence from such a silicon light-emitting diode can be obtained at a low current density of 0.3 A/cm2
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