Pump-probe experiments at 1.54μm on silicon-rich silicon oxide waveguides
Author(s) -
M. Forcales,
Nathanael J. Smith,
R. G. Elliman
Publication year - 2006
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.2206871
Subject(s) - nanoclusters , silicon , materials science , absorption (acoustics) , waveguide , silicon oxide , erbium , prism , free carrier absorption , optoelectronics , silicon photonics , oxide , beam (structure) , optics , analytical chemistry (journal) , doping , chemistry , nanotechnology , silicon nitride , physics , chromatography , metallurgy , composite material
Optical pump-probe measurements were performed on slab waveguides containing excess silicon in the form of nanoclusters or nanocrystals and erbium. The measurements were performed by prism coupling a 1.54μm probe beam into a waveguide formed by silicon-rich oxide and monitoring its intensity and temporal response as the waveguide was optically pumped from above with a chopped 477nm excitation source. Induced absorption (losses) of the 1.54μm probe beam in erbium-doped and undoped silicon-rich silicon oxide waveguides was observed in all cases. For the samples containing only well-defined nanocrystals, a fast (∼60μs) induced absorption component associated with free carriers within the silicon nanocrystals is reported, while for samples containing defective nanocrystals or nanoclusters, a much slower (>10min) component is observed. The free carrier absorption is shown to be reduced by delaying the probe beam relative to the pump beam in cases where it dominates.
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