Laser-induced microexplosion confined in a bulk of silica: Formation of nanovoids | Zendy

Saulius Juodkazis | Zendy; Hiroaki Misawa | Zendy; Tomohiro Hashimoto | Zendy; Eugene G. Gamaly | Zendy; Barry LutherDavies | Zendy

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Laser-induced microexplosion confined in a bulk of silica: Formation of nanovoids

Author(s) -

Saulius Juodkazis,

Hiroaki Misawa,

Tomohiro Hashimoto,

Eugene G. Gamaly,

Barry LutherDavies

Publication year - 2006

Publication title -

applied physics letters

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.182

H-Index - 442

eISSN - 1077-3118

pISSN - 0003-6951

DOI - 10.1063/1.2204847

Subject(s) - materials science , femtosecond , shock wave , dielectric , void (composites) , pulse duration , laser , wavelength , shock (circulatory) , rarefaction (ecology) , chemical physics , optoelectronics , optics , composite material , mechanics , chemistry , physics , medicine , ecology , species diversity , biology

We report on the nanovoid formation inside synthetic silica, viosil, by single femtosecond pulses of 30-100 nJ energy, 800 nm wavelength, and 180 fs duration. It is demonstrated that the void is formed as a result of shock and rarefaction waves at pulse power much lower than the threshold of self-focusing. The shock-compressed region around the nanovoid is demonstrated to have higher chemical reactivity. This was used to reveal the extent of the shock-compressed region by wet etching. Application potential of nanostructuring of dielectrics is discussed

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