p -type electrical conduction in α-AgGaO2 delafossite thin films
Author(s) -
K.A. Vanaja,
R. S. Ajimsha,
A.S. Asha,
M. K. Jayaraj
Publication year - 2006
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.2204757
Subject(s) - delafossite , materials science , thin film , pulsed laser deposition , band gap , seebeck coefficient , electrical resistivity and conductivity , heterojunction , optoelectronics , substrate (aquarium) , thermal conduction , thermoelectric effect , direct and indirect band gaps , analytical chemistry (journal) , nanotechnology , thermal conductivity , oxide , composite material , chemistry , metallurgy , oceanography , engineering , chromatography , geology , electrical engineering , physics , thermodynamics
Thin films of delafossites of α-AgGaO2 were prepared on α-Al2O3 (0001) and on Si (100) single crystal substrates by pulsed laser deposition. The films have a band gap of 4.12eV and a transparency of more than 50% in the visible region. The electrical conductivity at 300K was 3.2×10−4Scm−1. The positive sign of Seebeck coefficient (+70μVK−1) demonstrated the p-type conduction in the films. Transparent p-n heterojunctions on a glass substrate having a structure glass/ITO∕n-ZnO∕p-AgGaO2 were fabricated. The ratio of forward to reverse current was more than 100 in the range of −2to+2V.
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom