Nanolithography by elastomeric scattering mask: An application of photolithographic standing waves | Zendy

Gorgi Kostovski | Zendy; Arnan Mitchell | Zendy; Anthony S. Holland | Zendy; Ernest Fardin | Zendy; Michael W. Austin | Zendy

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Nanolithography by elastomeric scattering mask: An application of photolithographic standing waves

Author(s) -

Gorgi Kostovski,

Arnan Mitchell,

Anthony S. Holland,

Ernest Fardin,

Michael W. Austin

Publication year - 2006

Publication title -

applied physics letters

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.182

H-Index - 442

eISSN - 1077-3118

pISSN - 0003-6951

DOI - 10.1063/1.2190899

Subject(s) - photoresist , polydimethylsiloxane , photolithography , materials science , masking (illustration) , nanolithography , lithography , scattering , resist , elastomer , optics , optoelectronics , nanotechnology , composite material , fabrication , physics , medicine , art , alternative medicine , layer (electronics) , pathology , visual arts

An application is demonstrated for the much maligned standing wave in photolithography that is responsible for the sidewall corrugations in photoresist patterns. We demonstrate the realization of a polydimethylsiloxane (PDMS) scattering mask through the casting of these sidewall corrugations and their application as the masking components in an otherwise transparent bulk of PDMS. Photoresist structures with widths in the order of 80nm are realized by the application of this mask, demonstrating excellent correlation with the lateral depths of the sidewall corrugations. The continuity of the sidewall corrugations around corners makes both straight and curved lines realizable with equal simplicity.

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