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Optimization of negative ion sources for a heavy-ion-beam probe
Author(s) -
M. Nishiura,
T. Ido,
A. Shimizu,
Susumu Katō,
K. Tsukada,
A. Nishizawa,
Y. Hamada,
Yoshiyasu Matsumoto,
Alexander Mendenilla,
M. Wada
Publication year - 2006
Publication title -
review of scientific instruments
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.605
H-Index - 165
eISSN - 1089-7623
pISSN - 0034-6748
DOI - 10.1063/1.2170094
Subject(s) - plasma , ion , atomic physics , ion beam , sputtering , beam (structure) , ion beam deposition , ion source , materials science , ion gun , large helical device , plasma diagnostics , physics , optics , nuclear physics , thin film , nanotechnology , quantum mechanics
The development of plasma-sputter-type negative ion sources is underway for the heavy-ion-beam probe system as plasma diagnostic beams of the large helical device (LHD) for potential and fluctuation field measurements. Our purpose is to increase the doubly charged exchanged Au^+ beam intensity to enhance the detection signal after passing through the plasmas of the LHD. For this purpose, the characterization of the Au^? ion source and the beam optics has been carried out both experimentally and numerically. Based on these results, a new plasma-sputter-type negative ion source is designed and tested

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