Strong and stable ultraviolet emission from porous silicon prepared by photoetching in aqueous KF solution | Zendy

Katsuhiro Tomioka | Zendy; Sadao Adachi | Zendy

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Strong and stable ultraviolet emission from porous silicon prepared by photoetching in aqueous KF solution

Author(s) -

Katsuhiro Tomioka,

Sadao Adachi

Publication year - 2005

Publication title -

applied physics letters

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.182

H-Index - 442

eISSN - 1077-3118

pISSN - 0003-6951

DOI - 10.1063/1.2149157

Subject(s) - photoluminescence , porous silicon , ultraviolet , aqueous solution , silicon , fourier transform infrared spectroscopy , materials science , infrared , analytical chemistry (journal) , optoelectronics , photochemistry , chemistry , optics , physics , chromatography

A new method of fabricating porous silicon emitting in the ultraviolet (UV) spectral region ispresented. This method uses photoetching in an aqueous salt (KF) solution. Strong UVphotoluminescence is observed at 3.3 eV with a full width at a half maximum of 0.1 eV, whichis much narrower than those reported previously. Fourier transform infrared spectroscopy suggeststhat the surface oxide produced during photoetching plays an important role in the UV emission ofthe KF-prepared PSi

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