Open AccessStructural control of vertically aligned multiwalled carbon nanotubes by radio-frequency plasmas
Author(s) -
Jitendra Menda,
Benjamin Ulmen,
Lakshman Kumar Vanga,
Vijaya Kayastha,
Yoke Khin Yap,
Zhengwei Pan,
Ilia N. Ivanov,
Alexander A. Puretzky,
David B. Geohegan
Publication year - 2005
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.2115068
Subject(s) - plasma , materials science , carbon nanotube , chemical vapor deposition , decoupling (probability) , ionic bonding , nanotechnology , plasma processing , plasma enhanced chemical vapor deposition , chemical engineering , ion , chemistry , physics , organic chemistry , quantum mechanics , control engineering , engineering
Plasma-enhanced chemical vapor deposition is the only technique for growing individual vertically aligned multiwalled carbon nanotubes (VA-MWCNTs) at desired locations. Inferior graphitic order has been a long-standing issue that has prevented realistic applications of these VA-MWCNTs. Previously, these VA-MWCNTs were grown by a one-plasma approach. Here, we demonstrate the capability of controlling graphitic order and diameters of VA-MWCNTs by decoupling the functions of the conventional single plasma into a dual-plasma configuration. Our results indicate that the ionic flux and kinetic energy of the growth species are important for improving graphitic order of VA-MWCMTs.
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