Open AccessInterferometric Metrology for Sub-90-nm Node Phase-Shifting Photomasks
Author(s) -
Andrew J. Merriam
Publication year - 2005
Publication title -
aip conference proceedings
Language(s) - Uncategorized
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.2063004
Subject(s) - photomask , optics , metrology , reticle , photolithography , materials science , lithography , numerical aperture , interferometry , microscope , optoelectronics , physics , wavelength , nanotechnology , resist , wafer , layer (electronics)
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom