Gate Spacer Width Monitoring Study with Scatterometry Based on Spectroscopic Ellipsometry
Author(s) -
V. Vachellerie
Publication year - 2005
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.2062996
Subject(s) - critical dimension , metrology , materials science , transistor , optoelectronics , lithography , computer science , voltage , electronic engineering , optics , electrical engineering , engineering , physics
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