Open AccessElectron Cyclotron Resonance Based Chemically Assisted Plasma Etching Of Silicon in CF4/Ar Plasma
Author(s) -
R. K. Bhardwaj
Publication year - 2005
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.2062987
Subject(s) - electron cyclotron resonance , etching (microfabrication) , materials science , wafer , plasma etching , reactive ion etching , silicon , plasma , dry etching , isotropic etching , substrate (aquarium) , analytical chemistry (journal) , ion source , optoelectronics , atomic physics , nanotechnology , chemistry , physics , oceanography , layer (electronics) , quantum mechanics , chromatography , geology
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