Open AccessCombined XRR and RS Measurements of Nickel Silicide Films
Author(s) -
J. P. Gonchond
Publication year - 2005
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.2062960
Subject(s) - x ray reflectivity , silicide , annealing (glass) , electrical resistivity and conductivity , materials science , wafer , sheet resistance , nickel , nickel compounds , analytical chemistry (journal) , phase (matter) , diffraction , silicon , thin film , metallurgy , optoelectronics , optics , composite material , nanotechnology , chemistry , physics , layer (electronics) , quantum mechanics , chromatography , organic chemistry
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