Open AccessComplimentary Optical Metrology Techniques Used for Characterization of High-K Gate Dielectrics
Author(s) -
J. Price,
Alain C. Diebold,
Ramón Carriles,
Yongqiang An,
Jinhee Kwon,
Michael Downer
Publication year - 2005
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.2062950
Subject(s) - metrology , characterization (materials science) , materials science , dielectric , ellipsometry , optoelectronics , gate dielectric , interferometry , surface roughness , thin film , surface finish , high κ dielectric , sensitivity (control systems) , optics , electronic engineering , nanotechnology , electrical engineering , physics , engineering , transistor , voltage , composite material
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