Open AccessThe Use of Model Data to Characterize Depth Profile Generation from Angle Resolved XPS
Author(s) -
P. Mack
Publication year - 2005
Publication title -
aip conference proceedings
Language(s) - English
Resource type - Conference proceedings
SCImago Journal Rank - 0.177
H-Index - 75
eISSN - 1551-7616
pISSN - 0094-243X
DOI - 10.1063/1.2062947
Subject(s) - silicon oxynitride , materials science , x ray photoelectron spectroscopy , silicon , reproducibility , dielectric , analytical chemistry (journal) , optoelectronics , silicon nitride , chemistry , engineering , mathematics , statistics , chromatography , chemical engineering
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom