Open AccessStable, freestanding Ge nanocrystals
Author(s) -
Ian D. Sharp,
Qian Xu,
Chang Liao,
D. O. Yi,
Jeffrey W. Beeman,
Z. LilientalWeber,
K. M. Yu,
D. Zakharov,
Joel W. Ager,
D. C. Chrzan,
E. E. Häller
Publication year - 2005
Publication title -
journal of applied physics
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.1942629
Subject(s) - nanocrystal , materials science , annealing (glass) , amorphous solid , oxide , raman spectroscopy , etching (microfabrication) , wafer , chemical engineering , ion implantation , nanotechnology , layer (electronics) , ion , composite material , metallurgy , crystallography , chemistry , optics , physics , engineering , organic chemistry
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