Tuning negative differential resistance in a molecular film
Author(s) -
M. Grobis,
Andre Wachowiak,
Ryan Yamachika,
Michael F. Crommie
Publication year - 2005
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.1931822
Subject(s) - quantum tunnelling , materials science , scanning tunneling spectroscopy , scanning tunneling microscope , layer (electronics) , chemical physics , metal , molecule , differential (mechanical device) , optoelectronics , nanotechnology , condensed matter physics , chemistry , molecular physics , analytical chemistry (journal) , physics , thermodynamics , organic chemistry , metallurgy
We have observed tunable negative differential resistance (NDR) in scanningtunneling spectroscopy measurements of a double layer of C60 molecules on ametallic surface. Using a simple model we show that the observed NDR behavioris explained by voltage-dependent changes in the tunneling barrier height
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