Diffracted moiré fringes as analysis and alignment tools for multilayer fabrication in soft lithography
Author(s) -
JaeHwang Lee,
Chang-Hwan Kim,
YongSung Kim,
KaiMing Ho,
Kristen Constant,
Wai Leung,
ChaHwan Oh
Publication year - 2005
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.1927268
Subject(s) - moiré pattern , diffraction , optics , materials science , microfabrication , lithography , layer (electronics) , fabrication , soft lithography , photolithography , optoelectronics , physics , nanotechnology , medicine , alternative medicine , pathology
We studied the first-order diffracted moire fringes of transparent multilayered structures comprised of irregularly deformed periodic patterns. By a comparison study of the diffracted moire fringe pattern and detailed microscopy of the structure, we show that the diffracted moire fringe can be used as a nondestructive tool to analyze the alignment of multilayered structures. We demonstrate the alignment method for the case of layer-by-layer microstructures using soft lithography. The alignment method yields high contrast of fringes even when the materials being aligned have very weak contrasts. The imaging method of diffracted moire fringes is a versatile visual tool for the microfabrication of transparent deformable microstructures in layer-by-layer fashion.
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