Resonant-tunneling electron emitter in an AlN∕GaN system
Author(s) -
Atsuko Ishida,
Y. Inoue,
H. Fujiyasu
Publication year - 2005
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.1922081
Subject(s) - quantum tunnelling , common emitter , heterojunction , materials science , optoelectronics , wide bandgap semiconductor , electron , field electron emission , polarization (electrochemistry) , condensed matter physics , physics , chemistry , quantum mechanics
An AlN∕GaN multiple-barrier resonant-tunneling electron emitter is proposed in this letter, utilizing polarization fields in the AlN∕GaN heterostructure. The resonant-tunneling voltage is extremely high, compared with usual resonant-tunneling devices, due to the polarization field in the heterostructure, and this high resonant voltage enables practical use of the devices. Selective and high-density electron emission is to be expected through the resonant-tunneling layer and GaN surface accelerating layer.
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