Magnetic field effect on the terahertz emission from nanometer InGaAs/AlInAs high electron mobility transistors
Author(s) -
N. Dyakonova,
F. Teppe,
J. Łusakowski,
W. Knap,
M. E. Levinshteĭn,
А. П. Дмитриев,
M. S. Shur,
S. Bollaert,
A. Cappy
Publication year - 2005
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.1921339
Subject(s) - magnetic field , excitation , terahertz radiation , materials science , optoelectronics , electron mobility , electron , magnetoresistance , condensed matter physics , field effect transistor , transistor , voltage , physics , quantum mechanics
The influence of the magnetic field on the excitation of plasma waves in InGaAs/AlInAs lattice matched high electron mobility transistors is reported. The threshold source-drain voltage of the excitation of the terahertz emission shifts to higher values under a magnetic field increasing from 0 to 6 T. We show that the main change of the emission threshold in relatively low magnetic fields (smaller than approximately 4 T) is due to the magnetoresistance of the ungated parts of the channel. In higher magnetic fields, the effect of the magnetic field on the gated region of the device becomes important. (C) 2005 American Institute of Physics
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