Nanoengineered Curie temperature in laterally patterned ferromagnetic semiconductor heterostructures
Author(s) -
Khalid Eid,
B. L. Sheu,
O. Maksimov,
M. B. Stone,
P. Schiffer,
N. Samarth
Publication year - 2005
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.1900938
Subject(s) - curie temperature , annealing (glass) , materials science , ferromagnetism , condensed matter physics , nanolithography , nanowire , magnetic semiconductor , heterojunction , electrical resistivity and conductivity , curie , semiconductor , ferromagnetic material properties , optoelectronics , magnetization , metallurgy , fabrication , magnetic field , medicine , physics , alternative medicine , engineering , pathology , electrical engineering , quantum mechanics
We demonstrate the manipulation of the Curie temperature of buried layers ofthe ferromagnetic semiconductor (Ga,Mn)As using nanolithography to enhance theeffect of annealing. Patterning the GaAs-capped ferromagnetic layers intonanowires exposes free surfaces at the sidewalls of the patterned (Ga,Mn)Aslayers and thus allows the removal of Mn interstitials using annealing. Thisleads to an enhanced Curie temperature and reduced resistivity compared tounpatterned samples. For a fixed annealing time, the enhancement of the Curietemperature is larger for narrower nanowires.Comment: Submitted to Applied Physics Letters (minor corrections
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom