Open AccessMicrostructural comparisons of ultrathin Cu films deposited by ion-beam and dc-magnetron sputtering
Author(s) -
Walter L. Prater,
Emily Allen,
W.-Y. Lee,
Michael F. Toney,
A. J. Kellock,
Jonathan Daniels,
Jonathan A. Hedstrom,
Tammy Jeanne Harrell
Publication year - 2005
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.1886275
Subject(s) - materials science , electrical resistivity and conductivity , sputter deposition , cavity magnetron , microstructure , sputtering , pulsed dc , thin film , grain size , high power impulse magnetron sputtering , analytical chemistry (journal) , metallurgy , optoelectronics , nanotechnology , chemistry , electrical engineering , engineering , chromatography
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom