Controlling the properties of InGaAs quantum dots by selective-area epitaxy
Author(s) -
S. Mokkapati,
P. Lever,
Hark Hoe Tan,
C. Jagadish,
Katie E. McBean,
Matthew R. Phillips
Publication year - 2005
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.1875745
Subject(s) - quantum dot , cathodoluminescence , wafer , materials science , optoelectronics , molecular beam epitaxy , substrate (aquarium) , epitaxy , band gap , nanotechnology , gallium arsenide , luminescence , oceanography , geology , layer (electronics)
Selective growth of InGaAs quantum dots on GaAs is reported. It is demonstrated that selective-area epitaxy can be used for in-plane bandgap energy control of quantum dots. Atomic force microscopy and cathodoluminescence are used for characterization of the selectively grown dots. Our results show that the composition, size, and uniformity of dots are determined by the dimensions of the mask used for patterning the substrate. Properties of dots can be selectively tuned by varying the mask dimensions. A single-step growth of a thin InGaAs quantum well and InGaAs quantum dots on the same wafer is demonstrated. By using a single-step growth, dots luminescing at different wavelengths, in the range 1150–1230nm, in different parts of the same wafer are achieved.
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