z-logo
open-access-imgOpen Access
Buckled SiGe layers by the oxidation of SiGe on viscous SiO2 layers
Author(s) -
C.-Y. Yu,
P.-W. Chen,
S.-R. Jan,
M.-H. Liao,
K.F. Liao,
C. W. Liu
Publication year - 2004
Publication title -
applied physics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.182
H-Index - 442
eISSN - 1077-3118
pISSN - 0003-6951
DOI - 10.1063/1.1846937
Subject(s) - thermal oxidation , materials science , wafer , buckling , photoluminescence , wafer bonding , layer (electronics) , silicon on insulator , thermal , oxidation process , composite material , silicon , optoelectronics , chemical engineering , physics , meteorology , engineering

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom