Imaging optical near-fields of nanostructures | Zendy

P. Leǐderer | Zendy; Carolin Bartels | Zendy; Juliane König-Birk | Zendy; M. Mosbacher | Zendy; Johannes Boneberg | Zendy

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Imaging optical near-fields of nanostructures

Author(s) -

P. Leǐderer,

Carolin Bartels,

Juliane König-Birk,

M. Mosbacher,

Johannes Boneberg

Publication year - 2004

Publication title -

applied physics letters

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.182

H-Index - 442

eISSN - 1077-3118

pISSN - 0003-6951

DOI - 10.1063/1.1819990

Subject(s) - nanostructure , materials science , femtosecond , substrate (aquarium) , silicon , near field scanning optical microscope , optics , dielectric , nanolithography , nanotechnology , near field optics , near and far field , laser ablation , optoelectronics , laser , nanometre , optical microscope , scanning electron microscope , physics , fabrication , medicine , oceanography , alternative medicine , pathology , geology , composite material

We present a method for imaging the optical near-fields of nanostructures, which is based on the local ablation of a smooth silicon substrate by means of a single, femtosecond laser pulse. At those locations, where the field enhancement due to a nanostructure is large, substrate material is removed. The resulting topography, imaged by scanning electron or atomic force microscopy, thus reflects the intensity distribution caused by the nanostructure at the substrate surface. With this method one avoids a possible distortion of the field distribution due to the presence of a probe tip, and reaches a resolution of a few nanometers. Several examples for the optical near-field patterns of dielectric and metallic nanostructures are given.

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