Open AccessNanopatterning of epitaxial CoSi2 using oxidation in a local stress field and fabrication of nanometer metal-oxide-semiconductor field-effect transistors
Author(s) -
QingTai Zhao,
P. Kluth,
H.L. Bay,
St. Lenk,
S. Mantl
Publication year - 2004
Publication title -
journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.699
H-Index - 319
eISSN - 1089-7550
pISSN - 0021-8979
DOI - 10.1063/1.1808246
Subject(s) - materials science , optoelectronics , silicide , transistor , field effect transistor , fabrication , schottky barrier , mosfet , layer (electronics) , schottky diode , nanotechnology , silicon , electrical engineering , medicine , alternative medicine , pathology , voltage , diode , engineering
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